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Takeshi Hizawa, Senior Research Specialist from the Research Promotion Division received an "Outstanding Support for Research Award" in the field of science and technology for 2023 from the Minister of Education, Culture, Sports, Science and Technology.

Takeshi Hizawa being awarded an "Outstanding Support for Research Award" in 2023 marked a first for our university.
This award was established in 2020 with a view to commending those such as technical support staff who have contributed to the promotion of research and development through their advanced and specialized technical contributions in the field of research.

The award described Dr. Hizawa’s achievement as a "Contribution to Advanced Device Research by the Construction of a New Semiconductor Fabrication Environment."
Highly Skilled Professional Staff Takeshi Hizawa of Research Promotion Division
Ph.D. (Eng.) (Toyohashi University of Technology)
On receiving this award, Dr. Hizawa made the following comments:
I am very honored to have received the "Outstanding Support for Research Award" by commendation of the Minister of Education, Culture, Sports, Science and Technology. I would like to convey my heartfelt appreciation to everyone who has provided me with support.

A scene from practical training in the LSI factory
A scene from practical training in the LSI factory

The Institute for Research on Next-generation Semiconductor and Sensing Science at our university has the Venture Business Laboratory (LSI factory) where it is possible to carry out all of the operations involved in the prototyping of semiconductor devices, from design right through to manufacturing and evaluation. Nevertheless, our education and research worksites lacked the equipment required for prototyping, not to mention the required human resources, namely those equipped with advanced, specialized knowledge and the ability to provide technical support for semiconductor fabrication. I examined cutting-edge elemental technologies such as microfabrication and thin-film deposition, as well as integration technologies that optimize the combination of these technologies, and created a new semiconductor fabrication environment to provide tailor-made support to meet the needs of students and researchers. As a result, we were better able to facilitate the inspiration of students and researchers to create new advanced semiconductor devices, which led to numerous academic papers and conference presentations. I believe that the award was a recognition of my efforts to contribute to the progression of research in the abovementioned field.
Moving forward, I shall continue to do my utmost to contribute to the progression of research on next-generation semiconductor devices.

Takeshi Hizawa (Left) and President Kazuhiko Terashima (Right)
Takeshi Hizawa (Left) and President Kazuhiko Terashima (Right)

On April 19, the award ceremony was held at the Ministry of Education, Culture, Sports, Science and Technology (in an onsite and online hybrid format.) On May 30, our President Kazuhiko Terashima presented the award certificate and a certificate of merit to Dr. Hizawa.

令和5年度科学技術分野の文部科学大臣表彰 研究支援賞を研究推進課 飛沢 健 高度専門員が受賞しました

令和5年度科学技術分野の文部科学大臣表彰において、研究推進課 飛沢 健 高度専門員が研究支援賞を受賞しました。研究支援賞の受賞は、本学初となります。
「研究支援賞」は、研究現場において高度で専門的な技術的貢献を通じ、研究開発の推進に寄与する活動を行った技術職員等を顕彰するべく、令和2年度に創設されたものです。

【研究支援賞】
業績名「新規半導体製作環境構築による先端デバイス研究への貢献」
研究推進課 飛沢 健 高度専門員
学位:博士(工学)(豊橋技術科学大学)
受賞コメント:
このたび文部科学大臣表彰 研究支援賞を賜り、たいへん光栄に思います。支えてくださった皆様に、心から感謝申し上げます。
本学の次世代半導体・センサ科学研究所は、半導体試作における設計・製作・評価までを一貫して行うことのできるベンチャー・ビジネス・ラボラトリー(LSI工場)を有していますが、試作に必要な設備機器と共に、高度な専門知識を有し、半導体製作の技術支援ができる人材が教育・研究の現場から求められていました。私は微細加工、薄膜成膜などの先端の要素技術およびそれらの組み合わせを最適化したインテグレーション技術を検討、新規半導体製作環境を構築し、学生や研究者の要望に応じたオーダーメイド支援を行いました。その結果、学生や研究者の自由な発想から新たな半導体先端デバイスが創造され、多数の学術論文や学会発表に繋がり、当該研究の発展に貢献できた点をご評価いただいたと考えております。
これからも、次世代半導体デバイス研究の発展に少しでも貢献できるように、より一層精進して参ります。

4月19日、文部科学省での表彰式(現地とオンラインのハイブリッド方式)が行われたのち、5月30日、本学にて寺嶋一彦学長が賞状及び記念品を授与し、その栄誉を讃えました。

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