Harigai, Toru
Affiliation | Department of Electrical and Electronic Information Engineering |
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Title | Lecturer |
Fields of Research | Plasma Process Engineering / Carbon thin film |
Degree | Doctor of Engineering (Kochi University of Technology) |
Academic Societies | The Japan Society of Applied Physics / The Institute of Electrical Engineers of Japan / The Surface Finishing Society of Japan / Japan New Diamond Forum / Japan Solar Energy Society |
harigai.toru.un@ Please append "tut.jp" to the end of the address above. |
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Laboratory website URL | https://pes.ee.tut.ac.jp/harigai |
Researcher information URL(researchmap) | Researcher information |
Research
Plasma technology, used in lighting and semiconductor manufacturing processes, is an indispensable elemental technology in modern society. Plasma generated using electrical technology can synthesize and process a wide variety of materials. We study advanced plasma processes for amorphous carbon films as main target. DLC films have excellent mechanical, electrical, and chemical properties.Theme1:Ultra-high-rate deposition of hard carbon films with low friction coefficient
Overview
If DLC coating can be applied to many industrial products, energy loss in sliding parts of industrial products and processes will be reduced, resulting in significant energy savings. In our laboratory, We have developed a DLC deposition method with a deposition rate that is more than one order of magnitude faster than conventional methods.
Selected publications and works
[1] T. Harigai*, H. Ohhra, R. Tominaga, T. Bando, H. Takikawa, S. Kunitsugu, and H. Gonda, “Ultra-high-rate deposition of diamond-like carbon films using Ar/C2H2 plasma jet CVD in combination with substrate-stage discharge”, Japanese Journal of Applied Physics 61, SI1001 (2022).
Keywords
Theme2:Control of oxygen content in carbon films with highly biocompatibility
Overview
DLC films, which are chemically stable materials, exhibit excellent biocompatibility with minimal harm to the human body. In our laboratory, we have fabricated oxygen-contained DLC films using carbon monoxide (CO) plasma.
Selected publications and works
[1] T. Harigai*, S. Hamazaki, H. Ohhra, T. Bnado, H. Takikawa, and S. Kunitsugu, "Reduction of oxygen content in DLC films by mixing He in CO plasma", Proceedings of SPP-39 / SPSM34, LO26-AM-A-05, p.100 (2022).
Keywords
Title of class
Electrical Power Engineering 2
Ionized Gas
Applications of Electrical Engineering